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Patterning of Material Layers in Submicron Region

U. S. TandonW. S. Khokle

出版	J. Wiley, 1993
主題	Technology & Engineering / Electronics / GeneralTechnology & Engineering / Electronics / Circuits / GeneralTechnology & Engineering / Electronics / Circuits / IntegratedTechnology & Engineering / Industrial Technology
ISBN	81224056149788122405613
URL	http://books.google.com.hk/books?id=7GUbAQAAIAAJ&hl=&source=gbs_api

註釋

This book is endowed with quantitative features of the operational ingredients such as sources, resists, masks, writing/aligning/scanning techniques and commercial/captive systems. It is profusely illustrated with layout diagrams, flowcharts, analyses and SEM pictures of novel results to ensure lucidity. The book also presents various recent developments such as X-ray mask preparation, plasma developing resists and compact synchrotron with statistical details.