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Gas Phase Decomposition of an Organometallic Chemical Vapor Deposition Precursor to AlN: [Al(CH3)2NH2]3

Carmela C. AmatoJohn B. HudsonLeonard V. Interrante

出版	Office of Naval Research, 1990
URL	http://books.google.com.hk/books?id=HTg3HQAACAAJ&hl=&source=gbs_api