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Grain Size Effect on the Microhardness of BCC Metal Vapor Deposits
R. A. Bliss
J. P. Hayes
A. F. Jankowski
C. K. Saw
J. Go
R. F. Vallier
出版
United States. Department of Energy
, 2004
URL
http://books.google.com.hk/books?id=Jy-JDAEACAAJ&hl=&source=gbs_api
註釋
The physical vapor deposition methods of evaporation and sputtering are used to prepare foils of the body-centered-cubic metals, vanadium and tantalum. A two-fold increase in the micro-hardness is measured as the grain size decreases to the sub-micron scale. The micro-hardness of vanadium increases to 2.7 GPa and for tantalum to 2.9 GPa.
