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Particle Beam Microanalysis
註釋Particle beam methods of microanalysis allow high lateral and vertical resolution, high sensitivity, low detection limits, and high accuracy. This book concentrates on methods which complement each other and can be routinely applied in industrial laboratories: scanning and transmission electron microscopy, electron beam X-ray microanalysis, Auger electron microanalysis, and ion beam microanalysis as well as electron beam testing. The principal aim of this book is to support the analyst in his practical work. The theoretical basis is treated only to the extent required to obtain an understanding of the physical fundamentals and to allow effective use of the analytical instruments. The mode of operation of the instruments, the preparation of specimens, the evaluation of the measured signals as well as the detection limits are described in detail. A selection of practical examples drawn mainly from the field of semiconductor technology demonstrates the range of applications and the limitations of the various particle beam methods.