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Highly Damage-Resistant Reflectors for 248 Nm Formed by Fluorides Multilayers
I. Hashimoto
T. Izawa
Y. Matsumoto
Y. Owadano
R. Uchimura
T. Yakuoh
N. Yamamura
M. Yano
出版
ASTM International
, 1991
URL
http://books.google.com.hk/books?id=KsV5zgEACAAJ&hl=&source=gbs_api
註釋
We investigated the laser damage thresholds and optical performances of fluorides multilayered reflectors, consisting of middle index fluoride and Na3AlF6 for high power KrF laser applications. It was found the damage thresholds of those reflectors are significantly improved by laser annealing. Those reflectors with annealing resisted against the fluence of 18 - 27 J/cm2 (This fluence varies on combinations of various fluorides) for 248 nm, 15 nsec, 10 Hz pulses.
