登入選單
返回Google圖書搜尋
Atomic Layer Deposition Applications 3
Ana Londergan
出版The Electrochemical Society, 2007
主題Technology & Engineering / GeneralTechnology & Engineering / Electronics / SemiconductorsTechnology & Engineering / Superconductors & Superconductivity
ISBN15667757369781566775731
URLhttp://books.google.com.hk/books?id=WE1Lx5IKivQC&hl=&source=gbs_api
EBookSAMPLE
註釋Editors Londergan (Qualcomm MEMS Technologies), van der Straten (IBM Research), Bent (Stanford U.), Elam (Argonne National Laboratory), De Gendt (IMEC) and Kang (Samsung Electronics) have collected these research papers, which were originally presented at the third symposium on Atomic Layer Deposition Applications in 2007. Contributors in the field explore the latest technologies used to deposit ultra-thin coatings over precise 3-dimensional topography, emphasizing the use of emerging methods to expand the current spectrum of research. Written primarily for engineers and research scientists already familiar with atomic layer deposition, this book concentrates on such topics as ALD equipment and process integration, coatings on porous materials and gate stack applications.