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Early Testing of a Coarse/fine Precision Motion Control System

S. T. SmithD. L. TrumperH. YangR. J. HockenE. S. BuiceR. M. SeuglingD. Otten

出版	United States. Department of Energy, 2005
URL	http://books.google.com.hk/books?id=ZseSAQAACAAJ&hl=&source=gbs_api

註釋This abstract presents a brief overview of key components of a motion control stage for accurate nanometer level positioning for scanning specimens over an area measuring 50 mm x 50 mm. The completed system will utilize a short-range, third generation 6 degree-of-freedom fine motion control platform (4 microns, 160 micro-radians) carried by a long-range, two-axis x-y positioning system (50 mm x 50 mm). Motion of the controlled platform relative to a measurement frame will be measured using a heterodyne laser interferometer and capacitance sensing. The final stage will be mounted onto an isolation table in a vacuum chamber, itself on isolation supports mounted to a granite slab on bed rock and isolated from the main floor of the building. This whole system is housed in a temperature-controlled laboratory. It is envisaged that the current system will provide the ability to ''pick and place'' at nanometer levels and be used for long range scanning of specimens (including biological specimens), micro- /macroassembly, lithography and as a coordinate measuring machine (CMM). Furthermore, the system performance will be compared with other comparable systems at international locations such as, National Physical Laboratory (NPL) in the UK, Technical University of Eindhoven (TUE) in the Netherlands, Physikalisch-Technische Bundesanstalt (PTB) in Germany, and our own sub-atomic measuring machine (SAMM) [1, 2] at UNC-Charlotte. Critical requirements of the system are as follows: (1) Vacuum compatible to better than 20 mPa; (2) Range of 50 mm x 50 mm x 4 microns; (3) Maximum translation velocity of 5 mm {center_dot} s{sup -1}; (4) Sub-nanometer resolution; and (5) System accuracy of better than 10 nm.