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CMOS Past, Present and Future
Henry RadamsonEddy SimoenJun LuoChao Zhao
出版Woodhead Publishing, 2018-04-03
主題Technology & Engineering / Materials Science / GeneralTechnology & Engineering / Electronics / Semiconductors
ISBN00810214029780081021408
URLhttp://books.google.com.hk/books?id=cyk0DwAAQBAJ&hl=&source=gbs_api
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註釋CMOS Past, Present and Future provides insight from the basics, to the state-of-the-art of CMOS processing and electrical characterization, including the integration of Group IV semiconductors-based photonics. The book goes into the pitfalls and opportunities associated with the use of hetero-epitaxy on silicon with strain engineering and the integration of photonics and high-mobility channels on a silicon platform. It begins with the basic definitions and equations, but extends to present technologies and challenges, creating a roadmap on the origins of the technology and its evolution to the present, along with a vision for future trends. The book examines the challenges and opportunities that materials beyond silicon provide, including a close look at high-k materials and metal gate, strain engineering, channel material and mobility, and contacts. The book's key approach is on characterizations, device processing and electrical measurements. - Addresses challenges and opportunities for the use of CMOS - Covers the latest methods of strain engineering, materials integration to increase mobility, nano-scaled transistor processing, and integration of CMOS with photonic components - Provides a look at the evolution of CMOS technology, including the origins of the technology, current status and future possibilities