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Niobium Thin Film Coating on a 500-MHz Copper Cavity by Plasma Deposition

H. PhillipsRobert RimmerHaipeng WangAndy WuGenfa WuAnne-Marie Valente

出版	Thomas Jefferson National Accelerator Facility (U.S.), 2005
URL	http://books.google.com.hk/books?id=g6QOkAEACAAJ&hl=&source=gbs_api

註釋A system using an Electron Cyclotron Resonance (ECR) plasma source for the deposition of a thin niobium film inside a copper cavity for superconducting accelerator applications has been designed and is being constructed. The system uses a 500-MHz copper cavity as both substrate and vacuum chamber. The ECR plasma will be created to produce direct niobium ion deposition. The central cylindrical grid is DC biased to control the deposition energy. This paper describes the design of several subcomponents including the vacuum chamber, RF supply, biasing grid and magnet coils. Operational parameters are compared between an operating sample deposition system and this system. Engineering work progress toward the first plasma creation will be reported here.