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Resolution Enhancement Techniques in Optical Lithography
Alfred Kwok-Kit Wong
出版SPIE Press, 2001
主題Science / Physics / Optics & LightTechnology & Engineering / ElectricalTechnology & Engineering / Electronics / Circuits / GeneralTechnology & Engineering / Electronics / Circuits / IntegratedTechnology & Engineering / Electronics / SemiconductorsTechnology & Engineering / Industrial TechnologyTechnology & Engineering / Optics
ISBN08194399599780819439956
URLhttp://books.google.com.hk/books?id=gpuaXbzEBqEC&hl=&source=gbs_api
EBookSAMPLE
註釋The acceleration of integrated circuit miniaturization is challenging lithographers to push the limits of optical lithography by ever more precise engineering and innovations. As IC device dimensions grow smaller, circuits outpace the introduction of shorter exposure wavelengths and higher numerical aperture lenses, increasing the importance of resolution enhancement techniques. This work summarizes the latest enhancement research that has matured since the 1980s. Theoretical and practical aspects of commonly used techniques are discussed, serving students and practising lithographers alike. #Conoptical Imaging And Resolution; Modified Illumination; Optical Proximity Correction; Alternating Phase-Shifting Mask; Attenuated Phase-Shifting Mask; Selecting Appropriate Rets; Second Generation Rets; Concluding Remarks.