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Surface Engineering Series Volume 2: Chemical Vapor Deposition

Edited by Jong-Hee Park and T.S. Sudarshan

出版	ASM International, 2000-05-01
主題	Technology & Engineering / Chemical & BiochemicalTechnology & Engineering / Materials Science / GeneralTechnology & Engineering / Reference
URL	http://books.google.com.hk/books?id=nZkYj5d5aI8C&hl=&source=gbs_api
EBook	SAMPLE

註釋

This handbook provides guidelines and practical information on the chemical vapor deposition (CVD) process for surface engineering design, product development, and manufacturing. The first of the 14 chapters discuss the basic principles of CVD thermodynamics and kinetics, stresses and mechanical sta