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Principles, Characteristics, and Nanotechnology Applications
出版John Wiley & Sons, 2013-05-28
主題Technology & Engineering / Materials Science / Thin Films, Surfaces & InterfacesTechnology & Engineering / MechanicalScience / Chemistry / General
ISBN11180627799781118062777
URLhttp://books.google.com.hk/books?id=qqtWEAAAQBAJ&hl=&source=gbs_api
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註釋Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.