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Process Technology for Semiconductor Lasers
Kenichi IgaSusumu Kinoshita
其他書名
Crystal Growth and Microprocesses
出版Springer Science & Business Media, 2013-03-07
主題Science / Physics / Optics & LightTechnology & Engineering / Superconductors & SuperconductivityTechnology & Engineering / Electronics / GeneralTechnology & Engineering / GeneralScience / Physics / ElectromagnetismTechnology & Engineering / Engineering (General)
ISBN36427957659783642795763
URLhttp://books.google.com.hk/books?id=tnf1CAAAQBAJ&hl=&source=gbs_api
EBookSAMPLE
註釋Process Technology for Semiconductor Lasers describes the design principles of semiconductor lasers, mainly from the fabrication point of view. A review is given of the history of semiconductor-laser development and applications and of the materials used in lasing at short to long wavelengths. The basic design principles for semiconductor-laser devices and the epitaxy for laser production are discussed. An entire chapter is devoted to the technology of liquid-phase epitaxy, and another one to vapor-phase and beam epitaxies. The characterizations of laser materials and the fabrication and characteristics of semiconductor lasers are treated. Mode-control techniques are presented, and surface-emitting lasers are introduced in the final chapter.