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Extreme Ultraviolet Lithography

Harry J. Levinson

出版	SPIE Press, 2020
主題	Technology & Engineering / Engineering (General)Technology & Engineering / Optics
ISBN	151063939X9781510639393
URL	http://books.google.com.hk/books?id=vK0LzgEACAAJ&hl=&source=gbs_api

註釋

This book covers the many aspects of lithographic technology that needed to be addressed in order to make EUV lithography ready for high-volume manufacturing: exposure tools, light sources, masks, resists, process control, metrology, and computational lithography. Lithography costs, which have often influenced the areas of technical focus, are discussed. Potential improvements to current EUV technology and extensions to future nodes are also covered. Each topic is approached from the perspective of a practicing lithographer in a wafer fab, in either manufacturing or development, and there are many references at the end of each chapter.