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Characterization and Metrology for ULSI Technology 2005

出版	American Inst. of Physics, 2005-09-29
主題	Computers / Logic DesignMedical / GeneralScience / Physics / GeneralScience / Weights & MeasuresTechnology & Engineering / GeneralTechnology & Engineering / ElectricalTechnology & Engineering / Electronics / GeneralTechnology & Engineering / Electronics / Circuits / GeneralTechnology & Engineering / Electronics / Circuits / VLSI & ULSITechnology & Engineering / Engineering (General)Technology & Engineering / Industrial EngineeringTechnology & Engineering / MeasurementTechnology & Engineering / Quality Control
ISBN	07354027799780735402775
URL	http://books.google.com.hk/books?id=xlzxAAAAMAAJ&hl=&source=gbs_api

註釋This volume presents the proceedings of the March 2005 International Conference on Characerization and Metrology for ULSI [ultra large scale integrated] Technology, the fifth in a series of conferences devoted solely to silicon semiconductor characterization and metrology. The conference brought together engineers, scientists, and industry leaders concerned with all aspects of the technology, characterization techniques, and metrology for silicon research (including development, manufacturing, and diagnostics). The editors (alternately affiliated with the National Institute of Standards and Technology; SEMATECH, Metara, Inc.; Intel; the National Science Foundation; and Freescale Semiconductor, Inc.) organize the 105 peer-reviewed papers in accordance with the conference programming, grouping the contributions under the topic headings of plenary; front end--gate stack; front end--transistor channel, junctions, and contacts; critical metrology techniques; lithography--overlay metrology; lithography--mask metrology; interconnect/low-K; scanning electron microscopy; transmission electron microscopy; critical analytical techniques; and the future. The accompanying CD-ROM contains electronic versions of all the papers. Annotation :2005 Book News, Inc., Portland, OR (booknews.com).