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Photon, Beam and Plasma Assisted Processing
E.F. KrimmelI.W. Boyd
其他書名
Fundamentals and Device Technology
出版Elsevier, 1989-02-01
主題Technology & Engineering / Electronics / MicroelectronicsScience / Physics / Condensed MatterScience / Physics / Optics & LightScience / Physics / GeneralScience / Physics / Quantum TheoryScience / Spectroscopy & Spectrum AnalysisTechnology & Engineering / Electronics / GeneralScience / Chemistry / Analytic
ISBN04445963649780444596369
URLhttp://books.google.com.hk/books?id=yI1X21fmtSAC&hl=&source=gbs_api
EBookSAMPLE
註釋This symposium attracted 82 papers which were presented orally or as posters. Fourteen invited speakers presented state of the art reviews and aspects of future key topics in this increasingly important area of materials science. The high level of scientific presentation during the conference enhanced the aim of the symposium, which was to stimulate discussion amongst materials scientists, chemists, engineers and physicists with a common interest in this field and to disseminate knowledge of progress.